冰刻技术研究进展与展望

赵康; 赵鼎; 仇旻

doi:10.3981/j.issn.1000-7857.2025.05.00088

科技导报 >

2025 , Vol. 43 >Issue 12: 80 - 92

DOI: https://doi.org/10.3981/j.issn.1000-7857.2025.05.00088

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冰刻技术研究进展与展望

赵康 ,
赵鼎 ,
仇旻

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1. 西湖大学光电研究院, 浙江省3D微纳加工和表征研究重点实验室, 杭州 311421;
2. 西湖大学工学院电子信息工程系, 杭州 310030;
3. 浙江西湖高等研究院, 前沿技术研究所, 杭州 310024

赵康，助理研究员，研究方向为冰刻微纳加工技术，电子信箱:zhaokang@wioe.westlake.edu.cn；赵鼎（共同通信作者），研究员，研究方向为冰刻微纳加工技术，电子信箱:zhaoding@wioe.westlake.edu.cn；仇旻（通信作者），教授，欧洲科学院院士，研究方向为微纳光电子学，电子信箱:qiu_lab@westlake.edu.cn

收稿日期: 2025-05-01

修回日期: 2025-06-19

网络出版日期: 2025-07-03

基金资助

国家自然科学基金项目（U21A20494，52203305，61927820）

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Ice lithography: Advances and prospects

ZHAO Kang ,
ZHAO Ding ,
QIU Min

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1. Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, Westlake Institute for Optoelectronics, Hangzhou 311421, China;
2. Department of Electronic and Information Engineering, School of Engineering, Westlake University, Hangzhou 310030, China;
3. Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou 310024, China

Received date: 2025-05-01

Revised date: 2025-06-19

Online published: 2025-07-03

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摘要

冰刻技术（ice lithography）是一种基于电子束与低温材料相互作用的新型微纳加工方法，通过将特定气体在低温衬底表面凝结成固态冰胶，利用电子束辐照实现纳米精度的图案直写与转移。冰刻技术自提出以来凭借其独特优势快速发展：一是冰胶对电子束的低敏感性支持加工过程原位观察，可实现高精度套刻；二是冰胶可均匀覆盖非平面衬底，突破传统加工工艺对衬底平整度的依赖；三是冰胶经过升温即可去除，可实现全程无须溶剂的绿色加工，为敏感易损材料的加工提供了解决方案。回顾了冰刻技术的发展历程，从技术特点、加工精度、设备演进、工艺应用等方面总结了冰刻技术的重要成果和进展，并对未来的发展方向进行了展望。希望能激发跨学科的前沿研究，挖掘冰刻这一新兴技术在三维光电器件、生物传感、柔性电子等领域的应用潜力。

关键词： 冰刻; 纳米制造; 电子束光刻; 3D 纳米打印; 光电子器件

本文引用格式

赵康 , 赵鼎 , 仇旻 . 冰刻技术研究进展与展望[J]. 科技导报, 2025 , 43(12) : 80 -92 . DOI: 10.3981/j.issn.1000-7857.2025.05.00088

Abstract

Ice lithography (IL) is an emerging micro/nanofabrication technique based on electron beam interaction with cryogenic materials, which enables direct writing and transfer of nanoscale patterns through localized electron beam irradiation on solid ice resists formed by gas condensation on cryogenic substrates. Since its inception, this technology has rapidly evolved with distinctive advantages: Firstly, the low electron sensitivity of ice resists permits in situ observation during processing, facilitating high-precision overlay alignment. Secondly, ice films demonstrate exceptional conformal coverage on non-planar substrates, overcoming the planarization constraints inherent to conventional lithography. Thirdly, the solvent-free removal of ice resists via thermal desorption establishes an environmentally benign process, particularly advantageous for processing sensitive and fragile materials. This review systematically examines the historical development of IL, comprehensively summarizes key advancements in technical characteristics, fabrication accuracy, equipment evolution, and process applications, while providing prospects for future directions. It aims to stimulate interdisciplinary research and explore the application potential of this novel technology in emerging fields including three-dimensional optoelectronic devices, biosensing platforms, and flexible electronics.

Key words： ice lithography; nanofabrication; electron beam lithography; 3D nanoprinting; optoelectronic devices

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