科技导报 >

2025 , Vol. 43 >Issue 12: 80 - 92

DOI: https://doi.org/10.3981/j.issn.1000-7857.2025.05.00088

特色专题

冰刻技术研究进展与展望

  • 赵康 , 1 ,
  • 赵鼎 , 1, * ,
  • 仇旻 , 1, 2, 3, *
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  • 1. 西湖大学光电研究院, 浙江省3D微纳加工和表征研究重点实验室, 杭州 311421
  • 2. 西湖大学工学院电子信息工程系, 杭州 310030
  • 3. 浙江西湖高等研究院, 前沿技术研究所, 杭州 310024
赵鼎（共同通信作者），研究员，研究方向为冰刻微纳加工技术，电子信箱:
仇旻（通信作者），教授，欧洲科学院院士，研究方向为微纳光电子学，电子信箱:

赵康，助理研究员，研究方向为冰刻微纳加工技术，电子信箱:

收稿日期: 2025-05-01

  网络出版日期: 2025-07-03

基金资助

国家自然科学基金项目(U21A20494)

国家自然科学基金项目(52203305)

国家自然科学基金项目(61927820)

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版权所有，未经授权，不得转载。
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Ice lithography: Advances and prospects

  • Kang ZHAO , 1 ,
  • Ding ZHAO , 1, * ,
  • Min QIU , 1, 2, 3, *
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  • 1. Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, Westlake Institute for Optoelectronics, Hangzhou 311421, China
  • 2. Department of Electronic and Information Engineering, School of Engineering, Westlake University, Hangzhou 310030, China
  • 3. Institute of Advanced Technology, Westlake Institute for Advanced Study, Hangzhou 310024, China

Received date: 2025-05-01

  Online published: 2025-07-03

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All rights reserved. Unauthorized reproduction is prohibited.
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摘要

冰刻技术（ice lithography）是一种基于电子束与低温材料相互作用的新型微纳加工方法，通过将特定气体在低温衬底表面凝结成固态冰胶，利用电子束辐照实现纳米精度的图案直写与转移。冰刻技术自提出以来凭借其独特优势快速发展：一是冰胶对电子束的低敏感性支持加工过程原位观察，可实现高精度套刻；二是冰胶可均匀覆盖非平面衬底，突破传统加工工艺对衬底平整度的依赖；三是冰胶经过升温即可去除，可实现全程无须溶剂的绿色加工，为敏感易损材料的加工提供了解决方案。回顾了冰刻技术的发展历程，从技术特点、加工精度、设备演进、工艺应用等方面总结了冰刻技术的重要成果和进展，并对未来的发展方向进行了展望。希望能激发跨学科的前沿研究，挖掘冰刻这一新兴技术在三维光电器件、生物传感、柔性电子等领域的应用潜力。

关键词： 冰刻; 纳米制造; 电子束光刻; 3D纳米打印; 光电子器件

本文引用格式

赵康 , 赵鼎 , 仇旻 . 冰刻技术研究进展与展望[J]. 科技导报, 2025 , 43(12) : 80 -92 . DOI: 10.3981/j.issn.1000-7857.2025.05.00088

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