在自行研制的离子束辅助孪生磁场中频反应溅射设备中制备光学氧化钛薄膜，利用郎缪尔静电探针研究等离子特性变化，同时测定基片表面的伏安（I-V）特性。结果表明，随离子束功率密度不断提高，等离子体电子密度不断增加，悬浮负电位绝对值减小，溅射阴极电压下降；基片表面经历从富电子向富阳离子转变，基片正电位不断提高；辅助离子束为109 W时，基片表面处于电中性等离子体平衡态。
Optical titanium dioxide film is deposited with the ion beam assistant twin magnetron MF reactive sputtering equipment. The variation of reactive plasma is monitored by Langmuir probe and the I-V curve is also tested simultaneously. The results demonstrate that the assistant ion beam plays an important role in enhancement of electrical charge density in the plasma region. With the increase of ion beam power assistance, the electron density increases and both minus floating potential and reactive sputtering voltage decrease. The plus potential on the surface of the substrate increases during the variation from electron-rich to ion-rich state. The substrate steps into the plasma electric neutrality state when the ion beam assistance power supply is 109 W.
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