Progress in the Thh Film of nc-Si：H snd Its Application in Quantum Functional Devices

Science & Technology Review ›› 1998, Vol. 16 ›› Issue (9812) : 22-23.

PDF(214 KB)
PDF(214 KB)
Science & Technology Review ›› 1998, Vol. 16 ›› Issue (9812) : 22-23.
高技术

Progress in the Thh Film of nc-Si：H snd Its Application in Quantum Functional Devices

    {{javascript:window.custom_author_en_index=0;}}
  • {{article.zuoZhe_EN}}
Author information -
About authors:
Corresponding authors:

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

QR code of this article

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations
{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 1998, 16(9812): 22-23

References

List( Publishing order | Descend order by publishing year | Descend order by cited within ) Chart analysis

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}
{{article.copyrightLicense_en}}
PDF(214 KB)

Accesses

Citation

Detail
Sections
Recommended

Contact

  • Add：No. 86 Xueyuan South Road, Haidian District, Beijing　 Postal Code：100081
  • Tel: +86-10-62138113　Fax: +86-10-62138113
  • E-mail：kjdbbjb@cast.org.cn

    • Visited

      Total visitors:
      Visitors of today:
      Now online:
    Copyright © Science & Technology Review, All Rights Reserved.

    /

    〈 〉