In recent years, with continuous improvement of chip manufacturing technology, the development of lithography technology is facing some difficulties, which also affect the development of chip industry and the sustainability of Moore's Law. However, current mainstream extreme ultraviolet lithography technology is close to the manufacturing limit, and more advanced technology is needed to break through the technical bottleneck. In this paper, the concept of lithography based on dual-beam super-resolution technology is reviewed, and its advantages and potential are analyzed. At the same time, the challenges and possible solutions of this technology are proposed. This new lithography technology is expected to play an important role in the field of micro-nano manufacturing.
[1] Li L T, Jing B, Hu J X, et al. Study on chip reliability modeling based on mutually dependent competing failure of solder joints in different failure modes[J]. IEEE Access, 2020, 8:204695-204708.
[2] Wang J Y, Chen X Y, Liu H, et al. A method for manufacturing flexible microfluidic chip based on soluble material[J]. Journal of Nanomaterials, 2021, 2021:1280338.
[3] Rodríguez-Ruiz I, Teychené S, Van Pham N, et al. Broadcasting photonic lab on a chip concept through a low cost manufacturing approach[J]. Talanta, 2017, 170:180-184.
[4] Wang J, Long Y. On-chip silicon photonic signaling and processing:A review[J]. Science Bulletin, 2018, 63(19):1267-1310.
[5] Jin Z A, Li Y J, Yang Z, et al. Real-time indoor positioning based on BLE beacons and pedestrian dead reckoning for smartphones[J]. Applied Sciences, 2023, 13(7):4415.
[6] Kruit P, Ren Y. Multi-beam scanning electron microscope design[J]. Microscopy and Microanalysis, 2016, 22(S3):574-575.
[7] Li L, Liu X, Pal S, et al. Extreme ultraviolet resist materials for sub-7 nm patterning[J]. Chemical Society Reviews, 2017, 46(16):4855-4866.
[8] Wan L. High χ polystyrene-b-polycarbonate for next generation lithography[J]. Science China Chemistry, 2017, 60(6):679-680.
[9] Khan H N, Hounshell D A, Fuchs E R H. Science and research policy at the end of Moore's law[J]. Nature Electronics, 2018, 1(1):14-21.
[10] Zheng D Z, Xiang S Y, Guo X X, et al. Experimental demonstration of coherent photonic neural computing based on a Fabry-Perot laser with a saturable absorber[J]. Photonics Research, 2022, 11(1):65.
[11] 袁琼雁,王向朝.国际主流光刻机研发的最新进展[J].激光与光电子学进展, 2007, 44(1):57-64.
[12] 陈宝钦.光刻技术六十年[J].激光与光电子学进展, 2022, 59(9):0922031.
[13] 李艳丽,刘显和,伍强.先进光刻技术的发展历程与最新进展[J].激光与光电子学进展, 2022, 59(9):0922006.
[14] 林楠,杨文河,陈韫懿,等.极紫外光刻光源的研究进展及发展趋势[J].激光与光电子学进展, 2022, 59(9):25-44.
[15] Pan L, Park Y, Xiong Y, et al. Maskless plasmonic lithography at 22 nm resolution[J]. Scientific Reports, 2011, 1:175.
[16] Saifullah M S M, Asbahi M, Neo D C J, et al. Patterning at the resolution limit of commercial electron beam lithography[J]. Nano Letters, 2022, 22(18):7432-7440.
[17] Wang Y K, Yuan J D, Chen J P, et al. A single-component molecular glass resist based on tetraphenylsilane derivatives for electron beam lithography[J]. ACS Omega, 2023, 8(13):12173-12182.
[18] Kawata S, Sun H B, Tanaka T, et al. Finer features for functional microdevices[J]. Nature, 2001, 412(6848):697-698.
[19] Cao Y Y, Gan Z S, Jia B H, et al. High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization[J]. Optics Express, 2011, 19(20):19486-19494.
[20] Gan Z S, Cao Y Y, Evans R A, et al. Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size[J]. Nature Communications, 2013, 4:2061.
[21] Hein B, Willig K I, Hell S W. Stimulated emission depletion (STED) nanoscopy of a fluorescent protein-labeled organelle inside a living cell[J]. Proceedings of the National Academy of Sciences of the United States of America, 2008, 105(38):14271-14276.
[22] Hell S W, Wichmann J. Breaking the diffraction resolution limit by stimulated emission:Stimulated-emissiondepletion fluorescence microscopy[J]. Optics Letters, 1994, 19(11):780-782.
[23] Wen X W, Zhang B Y, Wang W P, et al. 3D-printed silica with nanoscale resolution[J]. Nature Materials, 2021, 20(11):1506-1511.
[24] Liu T Q, Tao P P, Wang X L, et al. Ultrahigh-printingspeed photoresists for additive manufacturing[J]. Nature Nanotechnology, 2024, 19(1):51-57.
[25] Gan Z S, Turner M D, Gu M. Biomimetic gyroid nanostructures exceeding their natural origins[J]. Science Advances, 2016, 2(5):e1600084.
[26] 骆志军,刘亚男,陈梦林,等.面向产业化应用的双光束超分辨数据存储技术[J].光电工程, 2019, 46(3):94-100.
[27] 骆志军,刘紫玉,王舒虹,等.下一代光刻机技术的探索:第六代双光束超分辨光刻机概念、技术和未来[J].激光与光电子学进展, 2022, 59(9):0922028.
